Returning from the low-magic world, do artificial intelligence first.

"The Emergence of Innovative Products in the Semiconductor Industry"

"ASML took the lead in developing EUV lithography machine"

"Chip process may increase tenfold"

"Chip technology has reached the physical limit"

While there were still hotspots such as "magic power" and "alien creatures", ASML's EUV lithography machine, under the operation of a group of capital behind it, immediately became a global hotspot.

Normally speaking, there are traces to follow for the update and iteration of a product, or there will be technical reserves.

For example, the EUV lithography machine is obviously a new track, and it has little to do with the previous DUV lithography machine, but in the parallel world, it just waited until the chip reached the 7nm bottleneck of the DUV lithography machine limit.

But here, because of the pressure brought by the Umbrella DUV lithography machine, as well as the prospects of artificial intelligence and quantum computing + supercomputing models are here.

In order to re-compete for this cutting-edge profit, for a better prospect.

When the top chip process is still 14nm, ASML has launched their EUV lithography machine.

And because of Umbrella's influence on the lens field, there is also a sense of competition brought about by other technologies.

The EUV lithography machine produced by ASML in advance this time is even better than the original planned technical parameters!

Fabs such as Semiconductor Manufacturing, Four Star, Intel, etc. have arrived and started assembly and debugging!
Apparently ASML’s EUV lithography machine didn’t mean that it was just built, but it was officially announced after they had already started supplying them and asked them to work overtime to complete the assembly.

The purpose is to achieve the goal in one step, and to reduce the reaction time for competitors!

The EUV lithography machine is much larger than DUV, weighing 180 tons, and even transportation requires a special vehicle, and it is quite troublesome to assemble.

If the staff of these cooperative fabs had not been trained in advance, it would be quite normal to install and debug for more than half a year from scratch.

But now, under the pressure from Umbrella, both ASML and the major fabs have shown their maximum potential, and all those working overtime have joined forces.

Under the hype fueled by various capitals, coupled with the multiple new sanctions against Umbrella this time, it also made many people feel relieved.

This time, I'm afraid the target is Umbrella!

"What a great handwriting!"

"I used to think that the World Company was wronged, but compared to the one against Umbrella, it is terrible!"

"The World Company was only incidentally affected, and the main target was placed on Umbrella. It's because their interests are too great."

"Asmail is so insidious, he has been covering it all the time, and he will come out almost as soon as the final decision is made."

"..."

As the discussion on the Internet fermented, when the heat reached its peak, Asmer also conducted a live broadcast.

At the same time, there are many semiconductor engineers such as SIMC, Four Star, Intel, etc., as well as professionals from chip design factories, packaging factories, etc.

Standing outside a factory building, everyone had smiles on their faces.

In front of the live broadcast, ASML’s engineer took the lead in introducing
"I'm afraid many people didn't expect that we would directly abandon the original mature DUV technology and develop EUV lithography machines directly from scratch."

While talking, they were still walking around the factory building.

"Perhaps from the very beginning, no one was optimistic about the EUV lithography machine, because although it can theoretically achieve ten times the resolution of the DUV lithography machine, it is too difficult, too difficult, and there are too many bottlenecks that need to be broken through. The demand for technology is extremely high, and there are countless difficulties to overcome.”

While speaking, he also opened the wristband, forming a three-dimensional holographic projection and briefly introduced

"Everyone knows that the essence of a lithography machine is exposure. For a DUV lithography machine, we can still find corresponding lenses to allow deep ultraviolet rays to pass through. Especially the new lenses produced by Umbrella's technology later strengthened this point. Umbrella's own lithography machine took advantage of this corner to overtake, and surpassed our efficiency without using the infiltration method!"

Asmail didn't try to belittle Umbrella, he could even brag about it.

Because only by embodying Umbrella's strength can it be shown that they are stronger!
This is a strong opponent, but still lost, lost in front of us!

"However, this is not true for EUV lithography machines. The 13.5nm wavelength extreme ultraviolet ionization ability we use is extremely strong. There is no lens that can pass this high-energy beam with this precision, so the only option is to reflection!"

While talking, the holographic image has also been changed, explaining the general principle.

It is to continuously use the reflection of some lenses to complete the convergence of extreme ultraviolet rays.

A total of more than a dozen reflections are required to meet the final exposure requirements!

"The precision requirements for reflective lenses can be said to be extremely high, and I would like to thank Carl Zeiss for its efforts in this regard."

After speaking, he made a gesture of please to the engineer of Carl Zeiss next to him.

The engineer from Carl Zeiss also stood up and said politely
"We also took advantage of Umbrella's technical coating, but of course, in terms of accuracy, we are still a little bit confident..."

Subsequently, representatives of ASML introduced their EUV light source.

"As I said before, extreme ultraviolet rays need to go through more than a dozen reflections to achieve our effect, and because of the ionization consumption of extreme ultraviolet rays, about 30% of the energy will be lost in each reflection, and in the end we can only use about 2% of the light effectively. , Therefore, we need the light source to have sufficient and stable output power. In order to overcome this problem, Cymer has spent ten years to overcome it, but Cymer has been acquired by our company three years ago..."

While talking, he continued to play the holographic screen, and even the principle was revealed in it, that is, the liquid metal droplets are constantly bombarded with high-energy lasers. Looking at the data he provided makes one's scalp tingle with difficulty and accuracy.

It’s just that it’s not difficult to manufacture, but to maintain a stable and durable light source with sufficient output power, it must ensure that each impact is extremely accurate and the frequency must be high enough.

Constantly bombarding the falling metal droplets, a slight mistake in all aspects is completely different.

With the continuous introduction later, the audience also understood how this machine is a monster combined.

Great and beautiful light source technology, neon light source conversion equipment, Gaul valve parts, Prussian lenses, and Swedish bearings all need to be extremely precise and indispensable, and even the installation must be extremely delicate to avoid slight vibrations from the surrounding environment .

Even the vehicle for transporting the lithography machine is a patented technology of a certain Semiconductor Manufacturing Company!
Now that the live broadcast is here, many viewers can see the problem.

EUV lithography machine is by no means a problem of two technologies, but brings together all the top technologies in the world.

And these top giants gathered together to suppress Umbrella Corporation.

Or directly rely on the technical difference, and complete the crushing method in one go!
This in itself is also a show of muscle performance!
Today, the mainstream chip technology has only reached 14nm.

However, the theoretical limit of the EUV lithography machine can reach the limit of silicon-based chips, which can reach 1nm!

If the tunneling problem can be solved, it can even be lower!

Yes, this is not in line with the laws of business and profit.

There is no slow update iteration to harvest.

But there is no way, Umbrella is too strong here, their DUV lithography machine is too good, and the chip is in a black box state and it is completely unclear.

In this situation, they can only take out the best in one breath and knock them down directly.

Although the chip has been overdrawn to the limit, it can make up for it in terms of quantum computing + supercomputing and artificial intelligence!
No matter how strong Umbrella's artificial intelligence is, it needs to rely on hardware!
Now, ASML is here to play its bright cards.

We have the most powerful technologies in the world.

"This is our EUV lithography machine. Although the installation and commissioning have only been completed in major fabs now, how to improve the process to the limit will depend on the means of the major fabs, but our tools have been produced anyway. , already has the conditions to learn from experience through trial and error, and can keep moving forward and forward...

"Umbrella is very strong, very strong, so strong that it is amazing. The holographic technology I am showing now, the enhanced coating on our lenses, and the structure of artificial intelligence, etc., have established the strength of Umbrella. Base.

"But, we are stronger..."

Then the camera zoomed out, and ASML and many companies involved in the design of EUV components, the three major EDA factories, the chip design factory, and all representatives of the wafer factory were all in the same frame.

Demonstrated their great confidence and strength.

The reason why this live broadcast is made is to announce it to everyone.

They have mastered the world's top technology.

The precipitation of this kind of technology is not something you can catch up in a short time!
You may be able to break through a certain bottleneck in the short term, but you cannot break through all the bottlenecks!
When you are chasing, we will continue to move forward, always walk in front, and build many barriers to block your way, let us always maintain the gap!

Let us always take the biggest profit!

You are against the world...

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The third update~the first update~