After rebirth, I started a life of attributes

Chapter 209: Stealing skills from teachers and piecing together parts

Time flies and another month passes.

There is still no progress in research on photolithography machines, which devastated Chen Feng.

In order to find new research ideas, Chen Feng decided to pay a secret visit to TSMC, one of the world's most advanced photolithography machine manufacturers, to learn their process technology.

I hope to get some inspiration from it and find ideas for manufacturing a nanometer lithography machine.

Chen Feng came to TSMC's factory. He pretended to be an intern and went deep into the production workshop to carefully observe the production process of the photolithography machine.

Chen Feng noticed that TSMC's photolithography machine uses a light source called "extreme ultraviolet light" when etching chips. The wavelength of this light source is very short, only thirteen nanometers, so the chip manufacturing process can be advanced to five nanometers. Chen Feng began to think, if we could find a shorter wavelength light source, could we advance the chip manufacturing process to one nanometer?
During the factory visit, Chen Feng also discovered a key technical detail: TSMC's photolithography machine uses a special coating technology when etching chips, which can make the wavelength of the light source more concentrated, thereby improving the etching efficiency. accuracy. This gave Chen Feng a great inspiration, and he began to think about whether the etching accuracy of the photolithography machine could be improved by improving the coating technology.

With these revelations, Chen Feng returned to Shuimu University. He started looking through a lot of information, looking for research on extreme ultraviolet light and coating technology. He found that the wavelength range of extreme ultraviolet light is from ten to one hundred nanometers, and the one-nanometer lithography machine he needs needs a light source with a wavelength below ten nanometers. However, our country is currently unable to produce such a short wavelength light source.

Chen Feng did not give up. He began to study various light sources, hoping to find a light source that could replace extreme ultraviolet light.

After a period of hard work, he finally discovered a light source called "soft X-ray". The wavelength of this light source is about ten nanometers, which is slightly longer than extreme ultraviolet light, but it is very close.

Moreover, the intensity of soft X-ray is much stronger than extreme ultraviolet light and can etch chips better.

Chen Feng began to design a nanometer lithography machine. He used soft X-rays as the light source and designed a brand new lithography machine. After many experiments, Chen Feng discovered that his photolithography machine could advance the chip manufacturing process to one nanometer. This made him very excited, as it meant a major breakthrough in his research.

Although the research has made a major breakthrough, there is still some way to go before the research is completed. At least the theoretical drawings of a one-nanometer lithography machine have not yet been drawn.

Therefore, after obtaining the idea of ​​conquering the one-nanometer lithography machine, Chen Feng immediately came to his "secret research base".

In the "secret research base", Chen Feng immediately began to draw, design and improve the theoretical drawings for the manufacturing of a nanometer lithography machine. He knows that this is a difficult task, which requires combining the knowledge he learned at TSMC with his own research results to design a lithography machine that fully meets the requirements of the one-nanometer process.

First, Chen Feng drew the overall structure of the lithography machine in detail on the drawings, including the light source, optical system, control system, mechanical structure and electrical system. During the drawing process, he constantly reviewed what he saw and heard during his visit to TSMC, and worked hard to incorporate those advanced technologies and design concepts into his drawings.

Next, Chen Feng began to design each part of the lithography machine in detail. He first conducted in-depth research on the light source part and analyzed the feasibility of soft X-ray as a light source. Through calculation and simulation, he obtained the parameters such as wavelength, intensity and focusing performance of the soft X-ray light source, and confirmed that the soft X-ray light source can meet the etching requirements of a one-nanometer lithography machine.

Then Chen Feng began to design the optical system. He referred to the optical system design of TSMC's lithography machine and combined it with his own research to design a new optical system. This system uses advanced lens and grating technology to focus soft X-rays onto the chip surface to achieve high-precision etching.

In terms of control system, Chen Feng designed an intelligent control system that can control various parts of the lithography machine through a computer to achieve automated production. This control system also has self-diagnosis and troubleshooting functions, which can improve the stability and reliability of the lithography machine.

In addition, Chen Feng also designed the mechanical structure and electrical system. He uses advanced materials and manufacturing processes to ensure that the mechanical structure of the lithography machine has sufficient stability and strength. In terms of electrical systems, he uses efficient and reliable electrical components to ensure that the lithography machine can work normally.

After completing the design of the theoretical drawings, Chen Feng repeatedly checked and modified the drawings to ensure that each part met the design requirements. He also invited colleagues and experts from the laboratory to review the drawings, listen to their opinions and suggestions, and further improve the drawings.

After months of hard work, Chen Feng finally completed the theoretical drawings for the manufacturing of a one-nanometer lithography machine. He was very excited because it marked an important advance in his research. Next, he will start actual manufacturing and testing to verify the feasibility of the drawings and the performance of the lithography machine.

……

However, the actual manufacturing process that followed was far more difficult than he imagined.

An important component of a nanometer lithography machine is the extreme ultraviolet light source, which is the heart of the entire lithography machine and determines the effect of lithography. However, this part is extremely difficult to manufacture and requires extremely high-precision parts to be assembled. Chen Feng searched all suppliers in China but could not find parts that could meet the requirements.

In desperation, Chen Feng could only choose to buy spare parts and then piece them together. The process was fraught with difficulties, but he did not give up. He first found a manufacturer specializing in the production of high-precision optical parts and purchased some basic optical parts. Then, he found some foreign second-hand parts suppliers through the Internet and purchased some advanced foreign parts.

The arrival times of these parts are not consistent. Chen Feng needs to wait for the arrival of each part before proceeding to the next step. This process took a long time, but Chen Feng didn't complain at all. He understands that this is the only way to success.

After all the parts arrived, Chen Feng started the assembly work. He first assembled the optical system, which is an important part of the entire lithography machine. He carefully installed every part and adjusted every parameter to ensure the stability and accuracy of the optical system.

He then carried out the assembly of the mechanical system. This part of the work is more tedious and requires extreme precision and patience. Chen Feng repeatedly debugged and continuously improved, and finally successfully assembled the mechanical system.

Finally, he performed the assembly of the electrical system. This is the control center of the entire lithography machine, which determines the operating efficiency and stability of the lithography machine. Chen Feng kept improving, constantly optimized the design of the electrical system, and finally successfully assembled the electrical system.

After all the parts were assembled, Chen Feng conducted a series of tests, and the results were very "touching".

The normal operation of a photolithography machine assembled from spare parts depends entirely on luck.

Sometimes it doesn't work.

For this reason, Chen Feng had to disassemble this small photolithography machine made of second-hand goods and check each component one by one.

However, what surprised Chen Feng was that each component worked perfectly fine individually, but not when they were assembled together. Whether they could work or not depended on luck.

"How did that happen"

Looking at the "small lithography machine" in front of him, Chen Feng fell into deep thought.

"Which link, which component is the problem? Why can each component operate normally individually, but not after they are assembled together?"

Chen Feng checked the "small lithography machine" again, but still could not find any problems. The inspection results showed that the parts and systems of the "small lithography machine" were normal, and it was a completely normal lithography machine. .

The only abnormal thing is that it is much smaller than the official version of the photolithography machine.

The photolithography machine assembled by Chen Feng is a mini version of the official photolithography machine. Although it is a mini version, it can be booted and run normally.

But now it just can't operate normally. Chen Feng can't find out what is the problem.

Chen Feng looked at the nanolithography machine in front of him, which was pieced together from loose parts, and felt helpless. This was a part that he spent several months traveling to technology markets across the country to find. He originally thought he could carry out the next step of research smoothly, but he didn't expect that the lithography machine would not be able to operate normally.

"Alas, it seems I can only find Li Nian." Chen Feng sighed, picked up his cell phone and dialed the familiar number.

Li Nian is a super-high IQ genius whom Chen Feng met in the library after he entered Shuimu University. His IQ is as high as 180.

Chen Feng's intelligence value was also increased to 180 by brushing Li Nian's intelligence.

Geniuses always attract each other. Two geniuses with an intelligence of 180 often visited the library. Over time, they became familiar with each other and became friends.

Chen Feng often discussed issues in the field of microelectronics with Li Nian, and Li Nian often asked Chen Feng about his knowledge and theoretical views on electrical engineering.

Soon, the two got acquainted and became close friends. Now that the mini lithography machine manufactured by Chen Feng could not operate normally, he immediately thought of his friend Li Nian and wanted to ask Li Nian to come over and help.

"Chen Feng, what's the matter? How's your research on the lithography machine going? Yesterday I heard you say that you put together one from spare parts. How's that going?" Li Nian's voice on the other end of the phone asked calmly as always.

As maverick geniuses, Li Nian and Chen Feng both have some arrogance as geniuses. People who do not meet their standards cannot enter their field of vision.

Therefore, they basically live alone.

But if we see each other right and become friends, we will talk about anything.

Because Chen Feng naturally informed Li Nian that he was researching a one-nanometer lithography machine alone.

"I've put it together, but there's something wrong with the lithography machine. I'd like you to come over and help." Chen Feng explained his purpose straightforwardly.

"Okay, but I'm not free now. I have a project to work on. I won't be free until tomorrow. I'll go back to your place tomorrow." Li Nian immediately agreed to Chen Feng's request without saying a word.

The next day, Li Nian came to Chen Feng's secret research base as promised. After learning about the photolithography machine, he began to carefully examine the equipment, which was pieced together from loose parts.

"Chen Feng, the source of parts for this photolithography machine is very complex, and there may be problems with the compatibility between some parts." Li Nian analyzed while inspecting.

"I have also thought about this problem, but I really can't find a better solution. After all, these parts are the most advanced nanolithography machine accessories currently available on the market. You know, with my strength, I can only buy these junk accessories to make up the money," Chen Feng said helplessly.

"You. I asked you to hand over your research to the school, but you didn't want to. You had to do it yourself. If you applied for a project from the school, you would be able to use genuine accessories, and there would be no such problem." Li Nian looked at it. Chen Feng smiled and shook his head.

"Let's do this. Let's start with the most basic circuit check to see if there are any bad contacts or short circuits." Li Nian suggested.

So the two began to check the components on the circuit board one by one, carefully checking every solder joint. After some efforts, they discovered a suspected short circuit.

"Chen Feng, look at this solder joint. Is there any problem?" Li Nian asked, pointing to a tiny solder joint on the circuit board.

"Yes, there does seem to be a problem with this solder joint. Let's quickly dismantle it and solder it again." Chen Feng said excitedly.

The two carefully removed the solder joints and then resoldered them. After finishing, they reassembled the lithography machine, connected it to power, and expected it to run normally.

However, when they pressed the start button, the lithography machine still failed to operate properly.

"It seems that the problem is not on the circuit board." Li Nian frowned and began to analyze other possible reasons.

Next, they checked the optical system, control system and gas circuit system of the lithography machine, but still did not find the problem.

"Chen Feng, I think we should carefully check every component of the lithography machine to see if any parts are damaged or incompatible." Li Nian said.

So, the two began a long investigation process. After checking numerous parts, they finally discovered a damaged part.

"Chen Feng, look at this part. It's damaged. We must quickly find a new part to replace it." Li Nian pointed to the damaged part and said.

"Okay, let me see which model of accessory this is." Chen Feng took the damaged accessory from Li Nian's hand and checked it.

The result is a model that is very difficult to get your hands on.

"Sure enough, it's an accessory for this model." Looking at the accessory in his hand, Chen Feng showed a sad face.

The damaged accessory is the "optical X-ray", which is the core accessory of the optical marking system.

There is none on the market.

Today's "optical X-ray" is a product that Chen Feng removed from a scrapped photolithography machine and renovated it.

(End of this chapter)