Military Industry of Great Powers: Build the Strongest Flanker.

Chapter 209: What does it mean to stare at someone and kill someone? The system is always confused.

I have only read three units, and there are already so many surprises. Mr. Mu is looking forward to the next ten units, but Teacher Xiao Zhao waved his hand and said there is no need to read the following.

"Why don't you watch it?"

Zhao Guoqing said: "The technology is not mature yet, there is nothing interesting to see!"

"..."

Mr. Mu smiled and said, "Now that you're here, let's take a look!"

Teacher Xiao Zhao couldn't resist and had no choice but to go to Building 04.

Mr. Mu was stunned as soon as he entered the laboratory...

"This...is this a pilot's helmet?"

Zhao Guoqing nodded. The helmet display system was at the forefront of Mr. Zhao's plan. Although many technical difficulties had been overcome, one key problem still could not be solved.

Mr. Mu noticed this problem when he put on the helmet. The helmet was too heavy. It felt like it weighed about five kilograms. If a pilot wore this thing, it would be overloaded by fifty or sixty kilograms at one acceleration. No one wearing this thing on their head could bear it. !

But after experiencing the functions, Mr. Mu was immediately impressed by the technology of 102 Institute.

He found that as the helmet moved, the radar antenna model in front of him could rotate accordingly.

And on the screen in front of you, you can see that the simulated target is being locked...

He just stared at the target and saw a circle on the target flashing continuously.

Zhao Guoqing said from the side: "If you are in firing mode, you will launch the missile as soon as you stare at it!"

"..."

"This is a system where anyone who stares will die!"

"What a stupid name, but I like it, haha!" Mr. Mu continued: "At the end of last year, I flew a Su-27 in Moscow. Mao Xiong also has this kind of helmet, but they won't sell it to us. I have worn it. Once, there is an optical sight on the helmet, and it is easy to fire, but compared to you, it seems not as advanced as you!"

Needless to say, Mao Xiong’s helmet is a second-generation helmet, while 102 Institute started directly with the third-generation helmet and also applied some technologies of the fourth-generation helmet.

Mr. Mu said: "This... helmet... when will it become shelf technology!"

"..." Zhao Guoqing said: "It still needs a little time!"

"..."

A high-resolution LCD display technology, CCD photosensitive chip, image processing, high-speed processing chip required for eye motion capture, as well as links and information processing computers connected to photoelectric detectors, aircraft radars, weapon systems, and various instruments Data docking interface...

Most of these problems have been solved since the 248nm lithography machine came to China...

…………

On the last day of June 1991, the first batch of seven lithography machines from ASML arrived in Shenzhen. Five of them were from Zhongxun Lithography Factory, and the other two were towed to Factory 6.

Compared with Zhongxun Technology's initial exploration of the 300-nanometer manufacturing process, Zhao Guoqing used two 102-nanometer lithography machines from the 248 Institute to directly challenge the extreme range of the 248-nanometer laser and the 180-nanometer manufacturing process.

Zhao Guoqing personally came to preside over this matter.

The photolithography machine workshop of Institute 102 has already been prepared in accordance with the requirements of a dust-free workshop. It took half a month to arrange the machines in place. The same workshop is also equipped with etching machines, cleaning machines and equipment from Nikon. It's the best in the world.

"Vapor phase base film formation!" Following the operator's instructions, the step-by-step procedure proceeds in an orderly manner.

"Rotate gluing!"

Inside the photolithography machine, the machine automatically coats the wafer with photoresist. As the wafer rotates, the inspection tool starts at the same time. It takes about three minutes. As the green light on the display light turns on, this step is completed, and the robot arm directly Send it to the soft oven. In the warm oven, the dry air with a temperature accurate to 87 degrees and a humidity of less than 7 slowly flows.

Each step is tracked by several sensors. After the photoresist is dried, it is sent to the workbench. The entire alignment only takes 30 seconds.

"Too advanced!"

"I thought PA3000 was already very advanced, but I didn't expect DU1800 to be so advanced!"

"Yeah, the whole process was shortened by seventeen minutes!"

Exposure requires five laser pulses, while multiple exposure requires setting up three exposures in the program, and then using the second mask to expose in two rounds to get the desired pattern. After completion, immerse it in the developer and take it out to continue baking. Pei, the sensor is developed and inspected...

The time has come to test technology. An advanced process cannot be solved by advanced lithography machines. Even Samsung and TSMC in the future are not restricted in buying DUV lithography machines, but they are engaged in 3 nanometers and 5 nanometers. Tens of billions of dollars will also be invested in research and development.

Advanced support requires designing matching semiconductor structures, such as FinFET structures, and exposure methods, such as multiple exposure schemes. Even if these are solved, these semiconductor transistors are manufactured on silicon wafers.

But if you don't solve another problem, the chip still won't work.

That's the wire that connects semiconductors.

The industry saying is metal pole + high dielectric constant insulating layer.

This is a problem that plagues all semiconductor manufacturers. For example, Intel has spent hundreds of millions of dollars to figure out how to turn the aluminum wires connecting the transistors into copper wires in the chip.

And they haven't solved it yet.

But Zhao Guoqing knows the most effective way to solve this problem based on his experience in the Berkeley University research laboratory.

That is the "metal gate", which can effectively solve a series of problems such as leakage or polysilicon gate depletion effects caused by weak gate dielectrics, and can provide the best performance.

This is the key to the future, discovered by stepping on the corpses of 99% of semiconductor manufacturers...

The exposed silicon wafer is etched to form a concave and convex surface. Next, the gate-last process is performed, and the drain/source region ion implantation operation is performed on the silicon wafer.

The next step is to heat the silicon wafer to 530 degrees Celsius for five minutes, and then anneal it within ten seconds.

It looks simple but is difficult to do. It involves 27 steps such as gate oxide layer, post-gate manufacturing, substrate processing, dummy gate construction, dummy gate removal, chemical mechanical polishing (CMP), etc. This does not include the steps between each step. Etching, cleaning and other contents...

If you make one wrong step, you won't be able to achieve the desired effect.

You can imagine how awesome the people who designed this process are.

This process is a 14-nanometer manufacturing process designed by Comrade Liang Jinsong who is still working at TSMC. This process can even be used on 7-nanometer chips.

Although Zhao Guoqing and Liang Jinsong had not met each other at that time, they were still considered alumni.

At the Physics Laboratory of the University of California, Berkeley, he and his partners, Professor Guillaume Lacolle, and Professor Hu Zhengmin, the inventor of the FinFET semiconductor structure, replicated the entire process...

deep impression……

(End of this chapter)