Super Copy of Great Power Technology

"When the chip processing process reaches 7nm, if we just reduce the size of the transistor, the leakage will be unbearable. So I infer that at the 7nm process node, a new transistor structure must be designed to reduce quantum tunneling. Through effect, reduce leakage. However, this design has not been introduced in the current mainstream EDA software. It is basically impossible to design a 7nm chip in the short term." Mr. Hu also expressed his inference, which is consistent with the reality. Basically consistent.

In order to solve the leakage problem of transistors below 7nm, the world's top chip R&D laboratories and wafer foundries have proposed a variety of different solutions. The more classic one is FinFET (Fin Field-Effect Transistor), whose Chinese name is Fin Type Field effect transistor. Using this new architecture can effectively reduce the leakage phenomenon between transistor electrodes and advance the chip manufacturing process to 3nm or even 2nm. Of course, these are R&D developments ten years later. At the moment in 12, FinFET is still just a theoretical conjecture. Even if individual teams have made transistors with this structure, they are limited to laboratories and have not been applied to actual chips. On production.

"I don't know if you have heard of FinFET technology. It can greatly increase the density of transistors per unit size and effectively reduce transistor leakage. The memory chips currently being produced on this chip production line are designed and produced based on FinFET technology. The memory particles that came out generate very little heat and have excellent overclocking performance." Qiao Ruida took out a memory particle the size of a fingernail from his pocket and showed it to everyone present.

Mr. Hu took the memory particle from Qiao Ruida and watched with interest, "2G LPDDR3, such a small memory particle is 2G in size. The 7nm process technology is really powerful. I have heard of this FinFET. There are some overseas The chip laboratory has already processed this kind of fin field effect transistor on the wafer. The parameters are indeed very good and can solve the problem of transistor leakage to a certain extent. But I have not heard of any wafer factory that will How do you apply FinFET technology in the actual production of chips?"

"This is a long story. As early as when we got this EUV lithography machine, we at Reda Technology started researching the production technology of 7nm chips. In order to solve the problem of transistor leakage, we designed a new FinFET architecture , and applied for a patent. This memory chip was designed based on this patent. Currently, our Ruida Technology R&D Department is writing a purely domestic EDA software, which includes the design functions of 7NM and even 5NM chips. When the EDA software is written, I can license it to you for free, and we can jointly develop and improve it, and strive to make an EDA software suitable for Chinese people."

Since the software R&D team and the chip R&D team of Reda Technology R&D Department returned to the company after taking their paid vacation, Qiao Reda has given them the task of developing EDA software. With a large amount of R&D information and actual chip design drawings provided by Qiao Ruida for reference, the development of the software is progressing very quickly. The test version of the EDA software should be completed soon and will be given to Loongson and HiSilicon. I found two powerful software testing institutions for free. If these two companies use this EDA software to really design a 7nm chip design, they can only get it to Rockchip Wafer Factory for tape-out and trial production. The money saved on software will be earned back sooner or later through the chip foundry business. Anyway, Qiao Ruida will definitely not lose money.

Mr. He gave Qiao Ruida a thumbs up and praised: "Mr. Qiao, despite his young age, is really far-sighted in the field of chip design. There are only two or three domestic chip EDA software companies that can catch up with the world's mainstream level. None. Mr. Qiao’s company just got involved in EDA software development and went straight to 7nm and 5nm, which are three or four process nodes ahead of the mainstream process. It is really bold for a skilled man. Mr. Qiao, wait until your EDA software is written. , we will definitely provide HiSilicon with a copy of the design of 7nm chips, which is really exciting."

"EDA software is out, don't forget our Loongson part. We have just completed the research and development of our independent instruction set LoongArch. If we use 7nm processing technology, our Loongson performance will soar to what extent, it is simply unimaginable. ." Mr. Hu was not to be outdone. In order to obtain the qualification to test the new EDA software, he even revealed some of the company's internal research and development progress.

The early models of Loongson were developed based on the MIPS architecture. However, with the development of the times and the continuous updating and iteration of technology, the old MIPS architecture gradually became unable to meet its requirements, and the performance of Loongson was severely limited. In order to improve the performance of Loongson and pursue the performance of mainstream computer CPUs, Loongson has embarked on the road of self-developed instruction sets. Of course, in 12, the instruction set used on Loongson is still a hybrid instruction set of MIPS and LoongArch, and has not yet evolved to the fully autonomous instruction set stage.

"Don't worry, seniors, our EDA software was designed to facilitate Chinese people to design chips. We had no intention of making money in this area. When the EDA software is developed, it will be given to your company for testing as soon as possible. , I hope you two can provide more suggestions for improvement at that time to help us improve this domestic EDA software as soon as possible."

A few people were chatting and walking, and soon came to the vicinity of the EDA lithography machine. Seeing the huge, science-fiction-like lithography machine in front of them, Mr. He couldn't help but his eyes lit up, and he exclaimed, "This is EUV lithography." Machine, it is indeed the most advanced chip lithography equipment in the world. Just looking at its shape and structure, it is much more advanced than DUV lithography machine. I heard that this kind of EUV lithography machine, lithography machine giant ASML also It is still under research and development. There are only test machines and no mass-produced products. Canon and Nikon in the island country do not have the ability to develop EUV lithography machines. Where did Mr. Qiao buy this EUV lithography machine? I’m really curious?”

"Haha, this is a company secret. It's really inconvenient to disclose it to the outside world. Mr. He, just think that we purchased it from ASML." This EUV lithography machine and even the entire 7nm chip production line were purchased by Qiao Ruida from ten years ago. I later searched for the photo on the Internet and copied it. These devices cannot be produced by current ASML and other companies at all, so Qiao Ruida had no choice but to explain their origins by citing company secrets as an excuse.

"Well, since it's a company secret, I won't ask. I really envy you. You have such an advanced chip production line. I think Mr. Qiao's Reda Technology Company has already started to develop its own mobile phone SOC." HiSilicon's mother The company Warwick also has a mobile phone business, so Mr. He asked this question. (End of chapter)